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| Committee |
Date Time |
Place |
Paper Title / Authors |
Abstract |
Paper # |
| IST |
2021-03-26
09:25 |
Tokyo |
Online |
Evaluation of the effect of the 3D defect distribution created by plasma process on the dark current characteristics
Yoshihiro Sato, Takayoshi Yamada, Kazuko Nishimura, Masayuki Yamasaki, Masashi Murakami (Panasonic), Keiichiro Urabe, Koji Eriguchi (Kyoto Univ.) |
Plasma processing is widely used in manufacturing present-day ULSI circuits. During plasma processing, defects are creat... [more] |
IST2021-9
pp.5-8 |
| IST, CE |
2012-03-30 |
Tokyo |
Kikai-Shinko-Kaikan Bldg. |
Extremely-Low-Noise CMOS Image Sensor with High Saturation Capacity
Kazuichiroh Itonaga, Kyohei Mizuta, Toyotaka Kataoka, Harumi Ikeda, Masashii Yanagita, Hiroaki Ishiwata, Yusuke Tanaka, Takashi Wakano, Yoshihisa Matoba, Tetsuya Oishi, Ryou Yamamoto, Shinichi Arakawa, Jun Komachi, Mikio Katsumata, Shinya Watanabe (Sony) |
We have developed a flat device structure, which we call “FLAT”, with no isolation grooves/ridges and no Si substrate et... [more] |
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