| Conference Information |
| Committee |
IST |
| Conference Date |
2015-05-08 - 2015-05-08 |
| Place (in Japanese) |
(See Japanese page) |
| Place (in English) |
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| Topics (in Japanese) |
(See Japanese page) |
| Topics (in English) |
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| Paper Information |
| Registration To |
IST |
| Conference Code |
2015-05-IST |
| Language |
Japanese |
| Title (in Japanese) |
(See Japanese page) |
| Sub Title (in Japanese) |
(See Japanese page) |
| Title (in English) |
Effect of random telegraph noise reduction by atomically flat gate insulator film/Si interface |
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| 1st Author's Name |
Rihito Kuroda |
| 1st Author's Affiliation |
Tohoku University (Tohoku Univ.) |
| 2nd Author's Name |
Toshiki Obara |
| 2nd Author's Affiliation |
Tohoku University (Tohoku Univ.) |
| 3rd Author's Name |
Tetsuya Goto |
| 3rd Author's Affiliation |
Tohoku University (Tohoku Univ.) |
| 4th Author's Name |
Naoya Akagawa |
| 4th Author's Affiliation |
Tohoku University (Tohoku Univ.) |
| 5th Author's Name |
Daiki Kimoto |
| 5th Author's Affiliation |
Tohoku University (Tohoku Univ.) |
| 6th Author's Name |
Akinobu Teramoto |
| 6th Author's Affiliation |
Tohoku University (Tohoku Univ.) |
| 7th Author's Name |
Shigetoshi Sugawa |
| 7th Author's Affiliation |
Tohoku University (Tohoku Univ.) |
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| Speaker |
Author-1 |
| Date Time |
2015-05-08 15:00:00 |
| Presentation Time |
30 minutes |
| Registration for |
IST |
| Paper # |
IST2015-33 |
| Volume (vol) |
vol.39 |
| Number (no) |
no.17 |
| Page |
pp.35-38 |
| #Pages |
4 |
| Date of Issue |
2015-05-01 (IST) |