Paper Abstract and Keywords |
Presentation |
2019-09-20 10:30
Back Side Illuminated High Dynamic Range 4.0um Voltage Domain Global Shutter Pixel Toshiyuki Isozaki, Kazuya Mori, Ken Miyauchi, Naoto Yasuda, Yusuke Sawai, Alex Tsai, Isao Takayanagi, Junichi Nakamura (BRILLNICS) |
Abstract |
(in Japanese) |
(See Japanese page) |
(in English) |
A backside illuminated image sensors with a 4.0μm global shutter (GS) pixel has been fabricated in a 45nm/65nm stacked CMOS process as a proof-of-concept vehicle. The pixel components for photon-to-voltage conversion are formed on the top substrate (the 1st layer). Each photo converted signal from the 1st layer pixel is stored in sample-and-hold (S/H) capacitors on the bottom substrate (the 2nd layer) via micro-bump interconnection to achieve a voltage domain GS function. The 2 sets of voltage domain storage capacitor per pixel enable a multiple gain readout to realize single exposure high dynamic range (SEHDR) [1] in the GS operation. |
Keyword |
(in Japanese) |
(See Japanese page) |
(in English) |
CMOS Image Sensor / High Dynamic Range / High Sensitivity / High Full Well Capacity / Low Noise / Single Exposure / Multiple Conversion Gains / Voltage Domain Global Shutter |
Reference Info. |
ITE Tech. Rep., vol. 43, no. 31, IST2019-44, pp. 5-8, Sept. 2019. |
Paper # |
IST2019-44 |
Date of Issue |
2019-09-13 (IST) |
ISSN |
Print edition: ISSN 1342-6893 Online edition: ISSN 2424-1970 |
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