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Paper Abstract and Keywords
Presentation 2021-03-26 09:25
Evaluation of the effect of the 3D defect distribution created by plasma process on the dark current characteristics
Yoshihiro Sato, Takayoshi Yamada, Kazuko Nishimura, Masayuki Yamasaki, Masashi Murakami (Panasonic), Keiichiro Urabe, Koji Eriguchi (Kyoto Univ.)
Abstract (in Japanese) (See Japanese page) 
(in English) Plasma processing is widely used in manufacturing present-day ULSI circuits. During plasma processing, defects are created in a material by incident plasma species. The defects are created not only in the depth direction but also in the lateral direction due to the stochastic lateral straggling of incident species. Although the density of defects created in the lateral direction is extremely small, it is predicted to become one of key issues in device designs which require ultra-low-density defects such as sensors and ultra-low power devices. The defects created by lateral straggling of incident species are difficult to detect using conventional analytical techniques. In this study, we have designed device structures with various lateral distances of pn junction to evaluate the defects in the lateral direction as well as that in the vertical direction. We analyzed the change in junction leakage current due to plasma-induced damage and clarified the density and profile of defects in the lateral direction. In addition, we focused on the dark current characteristics of the image sensor and verified the effect of low-density defects created in the lateral direction on the device performance.
Keyword (in Japanese) (See Japanese page) 
(in English) Plasma-induced damage / Defect / Dark current / pn junction / / / /  
Reference Info. ITE Tech. Rep., vol. 45, no. 11, IST2021-9, pp. 5-8, March 2021.
Paper # IST2021-9 
Date of Issue 2021-03-19 (IST) 
ISSN Print edition: ISSN 1342-6893  Online edition: ISSN 2424-1970
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Conference Information
Committee IST  
Conference Date 2021-03-26 - 2021-03-26 
Place (in Japanese) (See Japanese page) 
Place (in English) Online 
Topics (in Japanese) (See Japanese page) 
Topics (in English) Image Sensors, etc. 
Paper Information
Registration To IST 
Conference Code 2021-03-IST 
Language Japanese 
Title (in Japanese) (See Japanese page) 
Sub Title (in Japanese) (See Japanese page) 
Title (in English) Evaluation of the effect of the 3D defect distribution created by plasma process on the dark current characteristics 
Sub Title (in English)  
Keyword(1) Plasma-induced damage  
Keyword(2) Defect  
Keyword(3) Dark current  
Keyword(4) pn junction  
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1st Author's Name Yoshihiro Sato  
1st Author's Affiliation Panasonic Corporation (Panasonic)
2nd Author's Name Takayoshi Yamada  
2nd Author's Affiliation Panasonic Corporation (Panasonic)
3rd Author's Name Kazuko Nishimura  
3rd Author's Affiliation Panasonic Corporation (Panasonic)
4th Author's Name Masayuki Yamasaki  
4th Author's Affiliation Panasonic Corporation (Panasonic)
5th Author's Name Masashi Murakami  
5th Author's Affiliation Panasonic Corporation (Panasonic)
6th Author's Name Keiichiro Urabe  
6th Author's Affiliation Kyoto University (Kyoto Univ.)
7th Author's Name Koji Eriguchi  
7th Author's Affiliation Kyoto University (Kyoto Univ.)
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Speaker
Date Time 2021-03-26 09:25:00 
Presentation Time 25 
Registration for IST 
Paper # ITE-IST2021-9 
Volume (vol) ITE-45 
Number (no) no.11 
Page pp.5-8 
#Pages ITE-4 
Date of Issue ITE-IST-2021-03-19 


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