| Paper Abstract and Keywords |
| Presentation |
2021-03-26 09:25
Evaluation of the effect of the 3D defect distribution created by plasma process on the dark current characteristics
Yoshihiro Sato, Takayoshi Yamada, Kazuko Nishimura, Masayuki Yamasaki, Masashi Murakami (Panasonic), Keiichiro Urabe, Koji Eriguchi (Kyoto Univ.) |
| Abstract |
(in Japanese) |
(See Japanese page) |
| (in English) |
Plasma processing is widely used in manufacturing present-day ULSI circuits. During plasma processing, defects are created in a material by incident plasma species. The defects are created not only in the depth direction but also in the lateral direction due to the stochastic lateral straggling of incident species. Although the density of defects created in the lateral direction is extremely small, it is predicted to become one of key issues in device designs which require ultra-low-density defects such as sensors and ultra-low power devices. The defects created by lateral straggling of incident species are difficult to detect using conventional analytical techniques. In this study, we have designed device structures with various lateral distances of pn junction to evaluate the defects in the lateral direction as well as that in the vertical direction. We analyzed the change in junction leakage current due to plasma-induced damage and clarified the density and profile of defects in the lateral direction. In addition, we focused on the dark current characteristics of the image sensor and verified the effect of low-density defects created in the lateral direction on the device performance. |
| Keyword |
(in Japanese) |
(See Japanese page) |
| (in English) |
Plasma-induced damage / Defect / Dark current / pn junction / / / / |
| Reference Info. |
ITE Tech. Rep., vol. 45, no. 11, IST2021-9, pp. 5-8, March 2021. |
| Paper # |
IST2021-9 |
| Date of Issue |
2021-03-19 (IST) |
| ISSN |
Print edition: ISSN 1342-6893 Online edition: ISSN 2424-1970 |
| Download PDF |
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| Conference Information |
| Committee |
IST |
| Conference Date |
2021-03-26 - 2021-03-26 |
| Place (in Japanese) |
(See Japanese page) |
| Place (in English) |
Online |
| Topics (in Japanese) |
(See Japanese page) |
| Topics (in English) |
Image Sensors, etc. |
| Paper Information |
| Registration To |
IST |
| Conference Code |
2021-03-IST |
| Language |
Japanese |
| Title (in Japanese) |
(See Japanese page) |
| Sub Title (in Japanese) |
(See Japanese page) |
| Title (in English) |
Evaluation of the effect of the 3D defect distribution created by plasma process on the dark current characteristics |
| Sub Title (in English) |
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| Keyword(1) |
Plasma-induced damage |
| Keyword(2) |
Defect |
| Keyword(3) |
Dark current |
| Keyword(4) |
pn junction |
| Keyword(5) |
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| 1st Author's Name |
Yoshihiro Sato |
| 1st Author's Affiliation |
Panasonic Corporation (Panasonic) |
| 2nd Author's Name |
Takayoshi Yamada |
| 2nd Author's Affiliation |
Panasonic Corporation (Panasonic) |
| 3rd Author's Name |
Kazuko Nishimura |
| 3rd Author's Affiliation |
Panasonic Corporation (Panasonic) |
| 4th Author's Name |
Masayuki Yamasaki |
| 4th Author's Affiliation |
Panasonic Corporation (Panasonic) |
| 5th Author's Name |
Masashi Murakami |
| 5th Author's Affiliation |
Panasonic Corporation (Panasonic) |
| 6th Author's Name |
Keiichiro Urabe |
| 6th Author's Affiliation |
Kyoto University (Kyoto Univ.) |
| 7th Author's Name |
Koji Eriguchi |
| 7th Author's Affiliation |
Kyoto University (Kyoto Univ.) |
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| Speaker |
Author-1 |
| Date Time |
2021-03-26 09:25:00 |
| Presentation Time |
25 minutes |
| Registration for |
IST |
| Paper # |
IST2021-9 |
| Volume (vol) |
vol.45 |
| Number (no) |
no.11 |
| Page |
pp.5-8 |
| #Pages |
4 |
| Date of Issue |
2021-03-19 (IST) |