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Committee Date Time Place Paper Title / Authors Abstract Paper #
IST 2021-03-26
09:25
Tokyo Online Evaluation of the effect of the 3D defect distribution created by plasma process on the dark current characteristics
Yoshihiro Sato, Takayoshi Yamada, Kazuko Nishimura, Masayuki Yamasaki, Masashi Murakami (Panasonic), Keiichiro Urabe, Koji Eriguchi (Kyoto Univ.)
Plasma processing is widely used in manufacturing present-day ULSI circuits. During plasma processing, defects are creat... [more] IST2021-9
pp.5-8
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