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Paper Abstract and Keywords
Presentation 2008-09-12 13:00
[Special Talk] Next Generation Photopolymers for the Holographic Industry
Francois Deuber, Friedrich Bruder, Thomas Faecke, Rainer Hagen, Dennis Hoenel, David Jurbergs, Thomas Roelle (Bayer MS), Andy Volkov (Bayer plc), Marc-Stephan Weiser (Bayer MS)
Abstract (in Japanese) (See Japanese page) 
(in English) This paper describes a new class of recording materials for volume holograms suitable for commercial applications. These next generation holographic photopolymers have combine the ability to satisfy the unmet demand for color and depth tuning that is only possible with volume holograms with compatibility to industrial mass-production processes. Unlike earlier holographic photopolymers, these new materials offer the advantages of no chemical or thermal processing combined with low shrinkage and detuning. Furthermore, these materials offer a high resolution of more than 5000 lines/mm and are environmentally robust. Bayer MaterialScience plans to commercialize these materials in 2010.
In this paper, we describe the attributes of this new class of photopolymers, relate their ease of use in holographic recording, and discuss potential applications of such materials.
Keyword (in Japanese) (See Japanese page) 
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Reference Info. ITE Tech. Rep., vol. 32, no. 36, AIT2008-89, pp. 1-4, Sept. 2008.
Paper # AIT2008-89 
Date of Issue 2008-09-05 (AIT, 3DIT) 
ISSN Print edition: ISSN 1342-6893
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Conference Information
Committee AIT 3DMT OSJ-HODIC  
Conference Date 2008-09-12 - 2008-09-12 
Place (in Japanese) (See Japanese page) 
Place (in English) College of Science and Technology, Nihon Univ. 
Topics (in Japanese) (See Japanese page) 
Topics (in English) 3D Imaging and Holography 
Paper Information
Registration To AIT 
Conference Code 2008-09-AIT-3DIT-HODIC 
Language English 
Title (in Japanese) (See Japanese page) 
Sub Title (in Japanese) (See Japanese page) 
Title (in English) Next Generation Photopolymers for the Holographic Industry 
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1st Author's Name Francois Deuber  
1st Author's Affiliation Bayer MaterialScience AG (Bayer MS)
2nd Author's Name Friedrich Bruder  
2nd Author's Affiliation Bayer MaterialScience AG (Bayer MS)
3rd Author's Name Thomas Faecke  
3rd Author's Affiliation Bayer MaterialScience AG (Bayer MS)
4th Author's Name Rainer Hagen  
4th Author's Affiliation Bayer MaterialScience AG (Bayer MS)
5th Author's Name Dennis Hoenel  
5th Author's Affiliation Bayer MaterialScience AG (Bayer MS)
6th Author's Name David Jurbergs  
6th Author's Affiliation Bayer MaterialScience LLC (Bayer MS)
7th Author's Name Thomas Roelle  
7th Author's Affiliation Bayer MaterialScience AG (Bayer MS)
8th Author's Name Andy Volkov  
8th Author's Affiliation Bayer plc (Bayer plc)
9th Author's Name Marc-Stephan Weiser  
9th Author's Affiliation Bayer MaterialScience AG (Bayer MS)
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Date Time 2008-09-12 13:00:00 
Presentation Time 50 minutes 
Registration for AIT 
Paper # AIT2008-89, 3DIT2008-48 
Volume (vol) vol.32 
Number (no) no.36 
Page pp.1-4 
#Pages
Date of Issue 2008-09-05 (AIT, 3DIT) 


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