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Paper Abstract and Keywords
Presentation 2010-09-27 16:30
Techniques for high accurate and fast measurement of RTN and fabrication process conditions having a strong influence on RTN characteristics
Kenichi Abe, Akinobu Teramoto, Shigetoshi Sugawa, Tadahiro Ohmi (Tohoku Univ.)
Abstract (in Japanese) (See Japanese page) 
(in English) Physical analysis and reduction of random telegraph noise (RTN), which has become a major problem on advanced CMOS image sensor, are strongly required. This report proposes a new method to measure time constants and amplitudes of RTN with high precision and high speed by a large arrayed DUT test circuit based on CMOS image sensor technology. Moreover, we demonstrate some results from analysis of manufacturing process conditions which have strong effects on RTN characteristics.
Keyword (in Japanese) (See Japanese page) 
(in English) MOSFET / Random Telegraph Noise (RTN) / CMOS image sensor / test circuit / / / /  
Reference Info. ITE Tech. Rep., vol. 34, no. 38, IST2010-47, pp. 29-32, Sept. 2010.
Paper # IST2010-47 
Date of Issue 2010-09-20 (IST) 
ISSN Print edition: ISSN 1342-6893  Online edition: ISSN 2424-1970
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Conference Information
Committee IST  
Conference Date 2010-09-27 - 2010-09-27 
Place (in Japanese) (See Japanese page) 
Place (in English) Kikai-Shinko-Kaikan Bldg. 
Topics (in Japanese) (See Japanese page) 
Topics (in English)  
Paper Information
Registration To IST 
Conference Code 2010-09-IST 
Language Japanese 
Title (in Japanese) (See Japanese page) 
Sub Title (in Japanese) (See Japanese page) 
Title (in English) Techniques for high accurate and fast measurement of RTN and fabrication process conditions having a strong influence on RTN characteristics 
Sub Title (in English)  
Keyword(1) MOSFET  
Keyword(2) Random Telegraph Noise (RTN)  
Keyword(3) CMOS image sensor  
Keyword(4) test circuit  
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1st Author's Name Kenichi Abe  
1st Author's Affiliation Tohoku University (Tohoku Univ.)
2nd Author's Name Akinobu Teramoto  
2nd Author's Affiliation Tohoku University (Tohoku Univ.)
3rd Author's Name Shigetoshi Sugawa  
3rd Author's Affiliation Tohoku University (Tohoku Univ.)
4th Author's Name Tadahiro Ohmi  
4th Author's Affiliation Tohoku University (Tohoku Univ.)
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Speaker
Date Time 2010-09-27 16:30:00 
Presentation Time 30 
Registration for IST 
Paper # ITE-IST2010-47 
Volume (vol) ITE-34 
Number (no) no.38 
Page pp.29-32 
#Pages ITE-4 
Date of Issue ITE-IST-2010-09-20 


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