講演抄録/キーワード |
講演名 |
2013-12-12 16:15
積層スパッタ堆積による垂直磁気異方性Co/Pt膜の作製 ○土屋垂穂・本多直樹(東北工大) |
抄録 |
(和) |
原子層積層コリメータスパッタ堆積により,高磁気異方性Co/Pt積層膜の低温作製を検討した.基板温度が高いほど,また,Arガス圧力が高いほど,X線回折でL11規則化に対応する超格子回折線が観察されたが,規則化とは言えないほど微弱であった.しかし,作製膜は1000 emu/cm3ほどの飽和磁化と大きな垂直磁気異方性を示した.低Arガス圧力作製では,基板温度による磁気特性の変化は小さく,粒子間の交換結合が示唆された.一方,高Arガス圧力作製では,室温作製膜は粒子間の交換結合が弱く,抗磁力が5 kOeほどの膜が得られたが,200℃作製では粒子間交換結合が強くなり抗磁力は低下した.しかし,異方性磁界は20 kOeほどと見積もられ,これより磁気異方性は1×107 erg/cm3ほどと見積もられた.大きな垂直磁気異方性の原因はミクロな規則化と示唆される. |
(英) |
Low temperature preparation of Co/Pt stacked film with high magnetic anisotropy was studied using atomic layer stacking collimated sputter-deposition. Although a trace super lattice line corresponding to the L11 ordered phase was observed for films with higher Ar pressure and higher substrate temperature deposition in the X-ray diffraction, L11 ordering was not supposed to be obtained. Magnetic properties, however, exhibited a high saturation magnetization of about 1000 emu/cm3 and a large perpendicular magnetic anisotropy. Low Ar pressure sputtering at 0.8 Pa exhibited little difference in magnetic properties between films deposited at different substrate temperatures. On the contrary, the films deposited at a high Ar pressure of 9.6 Pa exhibited a high coercivity of 5 kOe for RT deposition, but the coercivity decreased and the anisotropy field was increased to be estimated as high as about 20 kOe, which indicated a high perpendicular anisotropy of 1×107 erg/cm3. The cause of the anisotropy was suggested to be come from micro ordering. |
キーワード |
(和) |
積層スパッタ堆積 / コリメータスパッタリング / 規則化CoPt膜 / 垂直磁気異方性 / 低温堆積 / / / |
(英) |
Layer stacking sputter-deposition / Collimated sputtering / Ordered CoPt film / Perpendicular magnetic anisotropy / Low temperature deposition / / / |
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