Paper Abstract and Keywords |
Presentation |
2015-09-18 14:00
High-Sensitivity Image Sensor with Stacked Structure comprising Crystalline Selenium Photoconductor, Crystalline OS FET, and CMOS FET Yoshiyuki Kurokawa, Takashi Nakagawa, Shuhei Maeda, Takuro Ohmaru, Takayuki Ikeda, Yasutaka Suzuki, Naoto Yamade, Hidekazu Miyairi (SEL), Shigeyuki Imura, Kenji Kikuchi, Kazunori Miyakawa, Hiroshi Ohtake, Misao Kubota (NHK), Makoto Ikeda, Shunpei Yamazaki (SEL) |
Abstract |
(in Japanese) |
(See Japanese page) |
(in English) |
To realize a high-sensitivity CMOS image sensor using avalanche multiplication, we investigate the feasibility of a pixel structure that uses a crystalline selenium-based photoelectric conversion element and a crystalline oxide semiconductor (OS)-based FET. The OS FET is shown to have a withstand voltage of over 20 V, with which the photoelectric conversion element can cause avalanche multiplication. An amorphous selenium-based photoelectric conversion element in which holes are mainly travelling carriers and which is formed on a pixel electrode on a pseudo OS FET/CMOS FET substrate exhibits favorable photoconductivity, indicating compatibility with an OS FET/CMOS FET hybrid process. This shows the potential for realizing an OS/CMOS image sensor using avalanche multiplication in a crystalline selenium-based photoelectric conversion element. |
Keyword |
(in Japanese) |
(See Japanese page) |
(in English) |
Crystalline oxide semiconductor / Crystalline selenium-based photoconductor film / CMOS image sensor / / / / / |
Reference Info. |
ITE Tech. Rep., vol. 39, no. 35, IST2015-51, pp. 33-36, Sept. 2015. |
Paper # |
IST2015-51 |
Date of Issue |
2015-09-11 (IST) |
ISSN |
Print edition: ISSN 1342-6893 Online edition: ISSN 2424-1970 |
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