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Presentation 2016-01-28 15:04
Plasma treatment for source/drain regions of self-aligned InGaZnO thin-film. -- Effects of substrate bias during the plasma treatment of IGZO. --
Yusaku Magari, Tatsuya Toda, Hisao Makino, Mamoru Furuta (Kochi Univ. of Technol.)
Abstract (in Japanese) (See Japanese page) 
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Conference Information
Committee IEICE-EID IDY IEE-EDD SID-JC IEIJ-SSL  
Conference Date 2016-01-28 - 2016-01-29 
Place (in Japanese) (See Japanese page) 
Place (in English) Toyama Univ. 
Topics (in Japanese) (See Japanese page) 
Topics (in English) Joint Meeting of Emissive / Non-Emissive Displays 
Paper Information
Registration To IEICE-EID 
Conference Code 2016-01-EID-IDY-EDD-JC-SSL 
Language Japanese 
Title (in Japanese) (See Japanese page) 
Sub Title (in Japanese) (See Japanese page) 
Title (in English) Plasma treatment for source/drain regions of self-aligned InGaZnO thin-film. 
Sub Title (in English) Effects of substrate bias during the plasma treatment of IGZO. 
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1st Author's Name Yusaku Magari  
1st Author's Affiliation Kochi University of Technology (Kochi Univ. of Technol.)
2nd Author's Name Tatsuya Toda  
2nd Author's Affiliation Kochi University of Technology (Kochi Univ. of Technol.)
3rd Author's Name Hisao Makino  
3rd Author's Affiliation Kochi University of Technology (Kochi Univ. of Technol.)
4th Author's Name Mamoru Furuta  
4th Author's Affiliation Kochi University of Technology (Kochi Univ. of Technol.)
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Date Time 2016-01-28 15:04:00 
Presentation Time 8 minutes 
Registration for IEICE-EID 
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Volume (vol) vol.40 
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