Paper Abstract and Keywords |
Presentation |
2020-07-01 13:30
Fabrication of Large-Size and High-Uniformity Thin Composite Emission Filter for Lens-Free Fluorescent Imager Erus Rustami, Kiyotaka Sasagawa, Thanet Pakpuwadon, Yasumi Ohta, Hironari Takehara, Makito Haruta, Jun Ohta (NAIST) |
Abstract |
(in Japanese) |
(See Japanese page) |
(in English) |
We report a composite emission filter fabrication using laser lift-off (LLO) and plasma etching method. The LLO used a high energy laser to separates filter from its substrate, whereas a SiF6 plasma etched silicon-substrate whereby the filter was deposited beforehand. As a result, spotless composite filters are successfully assembled in a micrometer-sized image sensor by LLO, yet the filter crack issue remains unsolved for large sensors. Conversely, the plasma etching produced large-size and spotless filters with relatively high reproducibility. This large-area etching capability, down to a centimeter range, can then be efficiently used for a multiple lens-free fluorescent device fabrication. |
Keyword |
(in Japanese) |
(See Japanese page) |
(in English) |
Lens-free imaging / Interference filter / Absorption filter / Laser lift-off / Plasma etching / / / |
Reference Info. |
ITE Tech. Rep., vol. 44, no. 14, IST2020-34, pp. 1-5, July 2020. |
Paper # |
IST2020-34 |
Date of Issue |
2020-06-24 (IST) |
ISSN |
Print edition: ISSN 1342-6893 Online edition: ISSN 2424-1970 |
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