| Paper Abstract and Keywords |
| Presentation |
2025-10-16 16:15
Fabrication of high-quality BiFeO3-based ferromagnetic and ferroelectric thin films by pulsed DC reactive sputtering method
Satoru Yoshimura, Swati S. DAS, Genta Egawa (Akita Univ.) |
| Abstract |
(in Japanese) |
(See Japanese page) |
| (in English) |
The pulsed DC reactive sputtering method is useful for fabricating high-quality oxide magnetic thin films, which often have complex crystal structures, at low oxygen partial pressures and high deposition rates. As a result of investigating the substitution elements in BiFeO3-based thin films fabricated using this method, we succeeded in realizing ferromagnetic and ferroelectric thin films with excellent magnetic properties, and we also succeeded in demonstrating magnetization switching by applying an electric field at the submicron scale, indicating the possibility of application to highly integrated and low-power magnetic devices driven by an electric field. However, it is essential to devise a method for giving the sputtering target in this film fabrication method as high an electrical conductivity as possible, and if one wishes to fabricate thin films with an excellent insulating property, it is also necessary to devise a method for increasing the oxygen content in the target while maintaining a high electrical conductivity. By using an appropriate target and the pulsed DC reactive sputtering method, various oxide magnetic thin films with characteristic properties and high functionalities can be easily fabricated with high quality, and as a result, high-performance spintronics devices will be implemented in society. |
| Keyword |
(in Japanese) |
(See Japanese page) |
| (in English) |
pulsed DC reactive sputtering / oxide magnetic thin films / magnetization switching by applying an electric field / sputtering target / / / / |
| Reference Info. |
ITE Tech. Rep., vol. 49, no. 28, MMS2025-43, pp. 4-9, Oct. 2025. |
| Paper # |
MMS2025-43 |
| Date of Issue |
2025-10-09 (MMS) |
| ISSN |
Online edition: ISSN 2424-1970 |
| Download PDF |
|
| Conference Information |
| Committee |
IEICE-MRIS IEICE-CPM MMS |
| Conference Date |
2025-10-16 - 2025-10-17 |
| Place (in Japanese) |
(See Japanese page) |
| Place (in English) |
Toyohashi-Gika Univ. |
| Topics (in Japanese) |
(See Japanese page) |
| Topics (in English) |
Spintronics, Solid State Memory, Functional material, Thin film process, Material, Devices, etc. |
| Paper Information |
| Registration To |
MMS |
| Conference Code |
2025-10-MRIS-CPM-MMS |
| Language |
Japanese |
| Title (in Japanese) |
(See Japanese page) |
| Sub Title (in Japanese) |
(See Japanese page) |
| Title (in English) |
Fabrication of high-quality BiFeO3-based ferromagnetic and ferroelectric thin films by pulsed DC reactive sputtering method |
| Sub Title (in English) |
|
| Keyword(1) |
pulsed DC reactive sputtering |
| Keyword(2) |
oxide magnetic thin films |
| Keyword(3) |
magnetization switching by applying an electric field |
| Keyword(4) |
sputtering target |
| Keyword(5) |
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| Keyword(6) |
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| 1st Author's Name |
Satoru Yoshimura |
| 1st Author's Affiliation |
Akita University (Akita Univ.) |
| 2nd Author's Name |
Swati S. DAS |
| 2nd Author's Affiliation |
Akita University (Akita Univ.) |
| 3rd Author's Name |
Genta Egawa |
| 3rd Author's Affiliation |
Akita University (Akita Univ.) |
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| Speaker |
Author-1 |
| Date Time |
2025-10-16 16:15:00 |
| Presentation Time |
25 minutes |
| Registration for |
MMS |
| Paper # |
MMS2025-43 |
| Volume (vol) |
vol.49 |
| Number (no) |
no.28 |
| Page |
pp.4-9 |
| #Pages |
6 |
| Date of Issue |
2025-10-09 (MMS) |