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Paper Abstract and Keywords
Presentation 2026-08-04 10:00
[Invited Talk] Further Scaling of the Capacitance Equivalent Thickness (CET) In High-k/Metal Gate Stacks Toward the 2nm Technology Node and Beyond: Prospects and Challenges
Yukinori Morita, Takamasa Kawanago, Takefumi Kamioka (AIST/LSTC), Yuichiro Mitani (Tokyo City Univ./LSTC), Toshihide Nabatame, Takashi Onaya, Naoki Fukata, Wipakorn Jevasuwan, Kazuhito Tsukagoshi (NIMS/LSTC), Takuya Hoshii (Science Tokyo/LSTC), Kasidit Toprasertpong, Atsushi Tamura, Koji Kita (The Univ. Tokyo/LSTC), Naoya Okada, Kenzo Manabe, Wataru Mizubayashi, Hiroyuki Ota, Takashi Matsukawa, Shinji Migita (AIST/LSTC)
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Conference Information
Committee IEICE-ICD IEICE-SDM IST  
Conference Date 2026-08-04 - 2026-08-06 
Place (in Japanese) (See Japanese page) 
Place (in English) Hokkaido Univ, Pharmaceutical Sciences, Lecture Room 2 
Topics (in Japanese) (See Japanese page) 
Topics (in English) Analog, Mixed Analog and Digital, RF, and Sensor Interface, Low Voltage/Low Power Techniques, Novel Devices/Circuits, and the Applications 
Paper Information
Registration To IEICE-SDM 
Conference Code 2026-08-ICD-SDM-IST 
Language Japanese 
Title (in Japanese) (See Japanese page) 
Sub Title (in Japanese) (See Japanese page) 
Title (in English) Further Scaling of the Capacitance Equivalent Thickness (CET) In High-k/Metal Gate Stacks Toward the 2nm Technology Node and Beyond: Prospects and Challenges 
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1st Author's Name Yukinori Morita  
1st Author's Affiliation National Institute of Advanced Industrial Science and Technology/LSTC (AIST/LSTC)
2nd Author's Name Takamasa Kawanago  
2nd Author's Affiliation National Institute of Advanced Industrial Science and Technology/LSTC (AIST/LSTC)
3rd Author's Name Takefumi Kamioka  
3rd Author's Affiliation National Institute of Advanced Industrial Science and Technology/LSTC (AIST/LSTC)
4th Author's Name Yuichiro Mitani  
4th Author's Affiliation Tokyo City University/LSTC (Tokyo City Univ./LSTC)
5th Author's Name Toshihide Nabatame  
5th Author's Affiliation National Institute for Materials Science/LSTC (NIMS/LSTC)
6th Author's Name Takashi Onaya  
6th Author's Affiliation National Institute for Materials Science/LSTC (NIMS/LSTC)
7th Author's Name Naoki Fukata  
7th Author's Affiliation National Institute for Materials Science/LSTC (NIMS/LSTC)
8th Author's Name Wipakorn Jevasuwan  
8th Author's Affiliation National Institute for Materials Science/LSTC (NIMS/LSTC)
9th Author's Name Kazuhito Tsukagoshi  
9th Author's Affiliation National Institute for Materials Science/LSTC (NIMS/LSTC)
10th Author's Name Takuya Hoshii  
10th Author's Affiliation Science Tokyo/LSTC (Science Tokyo/LSTC)
11th Author's Name Kasidit Toprasertpong  
11th Author's Affiliation The University of Tokyo/LSTC (The Univ. Tokyo/LSTC)
12th Author's Name Atsushi Tamura  
12th Author's Affiliation The University of Tokyo/LSTC (The Univ. Tokyo/LSTC)
13th Author's Name Koji Kita  
13th Author's Affiliation The University of Tokyo/LSTC (The Univ. Tokyo/LSTC)
14th Author's Name Naoya Okada  
14th Author's Affiliation National Institute of Advanced Industrial Science and Technology/LSTC (AIST/LSTC)
15th Author's Name Kenzo Manabe  
15th Author's Affiliation National Institute of Advanced Industrial Science and Technology/LSTC (AIST/LSTC)
16th Author's Name Wataru Mizubayashi  
16th Author's Affiliation National Institute of Advanced Industrial Science and Technology/LSTC (AIST/LSTC)
17th Author's Name Hiroyuki Ota  
17th Author's Affiliation National Institute of Advanced Industrial Science and Technology/LSTC (AIST/LSTC)
18th Author's Name Takashi Matsukawa  
18th Author's Affiliation National Institute of Advanced Industrial Science and Technology/LSTC (AIST/LSTC)
19th Author's Name Shinji Migita  
19th Author's Affiliation National Institute of Advanced Industrial Science and Technology/LSTC (AIST/LSTC)
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Date Time 2026-08-04 10:00:00 
Presentation Time 45 minutes 
Registration for IEICE-SDM 
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