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Committee Date Time Place Paper Title / Authors Abstract Paper #
IST 2015-05-08
Tokyo   Effect of random telegraph noise reduction by atomically flat gate insulator film/Si interface
Rihito Kuroda, Toshiki Obara, Tetsuya Goto, Naoya Akagawa, Daiki Kimoto, Akinobu Teramoto, Shigetoshi Sugawa (Tohoku Univ.)
 [more] IST2015-33
IST 2014-06-02
Tokyo   [Poster Presentation] Ultra-High Speed Capturing of Dielectric Breakdown of Metal-Oxide-silicon Capacitor up to 10M frame per second
Han Sho, Daiki Kimoto, Kiichi Furukawa, Hidetake sugo, Tohru Takeda, Ken Miyauchi, Yasuhisa Tochigi, Rihito Kuroda, Shigetoshi Sugawa (Tohoku Univ.)
 [more] IST2014-4
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