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 Conference Papers (Available on Advance Programs)  (Sort by: Date Descending)
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Committee Date Time Place Paper Title / Authors Abstract Paper #
IDY, IEICE-EID, IEE-EDD 2013-01-25
10:10
Shizuoka Shizuoka Univ. Fabrication and properties of Oxide TFT with an IGZO/AlOx stack prepared by non-vacuum process "mist CVD"
Toshiyuki Kawaharamura, Takayuki Uchida, Dapeng Wang, Masaru Sanada, Mamoru Furuta (KUT)
Last year, oxide TFT consisting of channel layer (IGZO) (47 nm) and gate insulator (AlOx) (116 nm) was fabricated by mis... [more] IDY2013-8
pp.73-76
IDY, IEICE-EID, IEE-EDD, IEIJ-OMD 2011-01-28
13:00
Kochi Kochi University of Technology Precisely patterned Zinc Oxide (ZnO) thin film phosphor fabricated directly on glass substrate -- after thin film fabrication with sputtering, wet etching, annealing --
Dapeng Wang, Toshiyuki Kawaharamura, Chaoyang Li, Takashi Hirao (Kochi Univ. Tech.)
The development of new and high efficient phosphor has been an important technology for the display industry. In order t... [more] IDY2011-1
pp.1-3
IDY, IEICE-EID, IEE-EDD, IEIJ-OMD 2011-01-28
14:40
Kochi Kochi University of Technology Growth of Magnesium Oxide (MgO) Thin Film with Mist Deposition. -- Challenge to low temperature growth under the atmospheric pressure --
Toshiyuki Kawaharamura (Kochi Univ. Tech.), Hiroyuki Orita, Takahiro Shirahata (TMEIC), Takuto Igawa, Hiroshi Ito (Kyoto Univ.), Akio Yoshida (TMEIC), Shizuo Fujita (Kyoto Univ.), Takashi Hirao (Kochi Univ. Tech.)
Magnesium oxide (MgO) thin film is useful as the protective film for plasma display and the antireflective film. Therefo... [more] IDY2011-3
pp.45-48
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