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 Conference Papers (Available on Advance Programs)  (Sort by: Date Descending)
 Results 1 - 5 of 5  /   
Committee Date Time Place Paper Title / Authors Abstract Paper #
ME, JSKE 2015-10-29
15:20
Aichi   Consideration for continuous development of small-scale farmhouse
Takahiro Katou, Masao Kasuga (Sakushin Gakuin Univ)
Abstract This paper considers the historical transition of agriculture after world war, the history of the JA(Japan Agr... [more] ME2015-108
pp.17-20
IST, IEICE-ICD 2014-07-03
13:55
Shimane   [Invited Talk] Characterization of Individual Oxide Traps Contributing to Multi-Trap Random Telegraph Noise in Nano-Scaled MOSFETs
Toshiaki Tsuchiya (Shimane Univ.)
We propose a novel method for characterizing the oxide traps that participate in random telegraph noise (RTN) by using c... [more] IST2014-32
pp.29-30
IST 2013-05-31
13:00
Tokyo   [Poster Presentation] A CMOS Image Sensor using Floating Capacitor Load Readout Operation
Shunichi Wakashima, Yasuyuki Goda, Tsung-Ling Li, Rihito Kuroda, Shigetoshi Sugawa (Tohoku Univ.)
Floating capacitor load readout operation is a new readout operation of pixel signals which uses neither current source ... [more] IST2013-23
pp.33-36
IST, CE 2012-03-30 Tokyo Kikai-Shinko-Kaikan Bldg. Extremely-Low-Noise CMOS Image Sensor with High Saturation Capacity
Kazuichiroh Itonaga, Kyohei Mizuta, Toyotaka Kataoka, Harumi Ikeda, Masashii Yanagita, Hiroaki Ishiwata, Yusuke Tanaka, Takashi Wakano, Yoshihisa Matoba, Tetsuya Oishi, Ryou Yamamoto, Shinichi Arakawa, Jun Komachi, Mikio Katsumata, Shinya Watanabe (Sony)
We have developed a flat device structure, which we call “FLAT”, with no isolation grooves/ridges and no Si substrate et... [more]
IST 2010-09-27
16:30
Tokyo Kikai-Shinko-Kaikan Bldg. Techniques for high accurate and fast measurement of RTN and fabrication process conditions having a strong influence on RTN characteristics
Kenichi Abe, Akinobu Teramoto, Shigetoshi Sugawa, Tadahiro Ohmi (Tohoku Univ.)
Physical analysis and reduction of random telegraph noise (RTN), which has become a major problem on advanced CMOS image... [more] IST2010-47
pp.29-32
 Results 1 - 5 of 5  /   
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