| Committee |
Date Time |
Place |
Paper Title / Authors |
Abstract |
Paper # |
| IDY, IEICE-EID, IEIJ-SSL, SID-JC, IEE-EDD [detail] |
2020-01-23
13:10 |
Tottori |
Tottori Univ |
[Poster Presentation]
Mist CVD of ZnO-based nanoparticle dispersed thin films
Naoki Oshiro, Shogo Onoda, Toshihiro Nara, Hiroko Kominami, Kazuhiko Hara (Shizuoka Univ.) |
As one of the nanoparticle-dispersed semiconductor films we have proposed for novel phosphor applications, ZnO-nanoparti... [more] |
IDY2020-3
pp.5-8 |
| IEICE-SDM, IEICE-EID, IDY [detail] |
2019-12-24
13:45 |
Nara |
NAIST |
Development of memristor using Ga-Sn-O thin film by mist CVD method
Masaki Kobayashi, Sumio Sugisaki, Mutsumi Kimura (Ryukoku Univ.) |
We are conducting research on Resistive Random Access Memory (ReRAM) using Ga-Sn-O(GTO) thin films. In this study, we fa... [more] |
IDY2019-69
pp.5-8 |
| IEICE-SDM, IEICE-EID, IDY [detail] |
2019-12-24
14:05 |
Nara |
NAIST |
Ga-Sn-O TFT fabricated on Al2O3 insulating film
Kazuki Hattori, Kenta Tanino, Tokiyoshi Matsuda, Mutsumi Kimura (Ryukoku Univ), Toshiyuki Kawaharamura, Li Liu (Kochi Univ of Tech) |
We compared the characteristics of Ga-Sn-O Thin Film Transistors (GTO TFTs) with and without an Al2O3 film by mist Chemi... [more] |
IDY2019-70
pp.9-12 |
| IEICE-EID, IEICE-SDM, IDY [detail] |
2018-12-25
11:45 |
Kyoto |
|
Device Using Thin Film of GTO by MistCVD Method
Yuta Takishita, Sumio Sugisaki (Ryukoku Univ.), Daichi Koretomo, Yusaku Magari, Mamoru Furuta (KUT), Tokiyoshi Matsuda, Mutsumi Kimura (Ryukoku Univ.) |
We made devices using Ga-Sn-O(GTO) thin films deposited by mist CVD method. A thin film transistor incorporating GTO pre... [more] |
IDY2018-57
pp.13-16 |
| AIT, IIEEJ, AS, CG-ARTS |
2018-03-16
14:15 |
Tokyo |
Tokyo University of Technology |
Simulation of Fog Generation due to Radiative Cooling based on Cellular Automaton
Yusuke Yato (TDU), Tokiichiro Takahashi (TDU/ASTRODESIGN) |
If fog occurs in urban areas, it would cause a big troubles on our lives. In order to avoid such situations, a system wh... [more] |
AIT2018-147
pp.377-380 |
| IEICE-EID, IDY, IEIJ-SSL, IEE-EDD, SID-JC [detail] |
2014-01-25
09:00 |
Niigata |
Niigata University |
Synthesis of emissive oxide liquid crystal material by a soft-chemical process
Mizuki Watanabe, Kazuyoshi Uematsu, Sun Woog Kim, Kenji Toda, Mineo Sato (Niigata Univ.) |
The novel red-emissive nematic inorganic liquid crystal material, HEu(MoO4)2 nanoscroll solution was obtained by the H+-... [more] |
IDY2014-11
pp.61-64 |
| IDY, IEICE-EID, IEE-EDD |
2013-01-25
10:10 |
Shizuoka |
Shizuoka Univ. |
Fabrication and properties of Oxide TFT with an IGZO/AlOx stack prepared by non-vacuum process "mist CVD"
Toshiyuki Kawaharamura, Takayuki Uchida, Dapeng Wang, Masaru Sanada, Mamoru Furuta (KUT) |
Last year, oxide TFT consisting of channel layer (IGZO) (47 nm) and gate insulator (AlOx) (116 nm) was fabricated by mis... [more] |
IDY2013-8
pp.73-76 |
| IDY, IEICE-EID, IEE-EDD, IEIJ-OMD |
2011-01-28
14:40 |
Kochi |
Kochi University of Technology |
Growth of Magnesium Oxide (MgO) Thin Film with Mist Deposition.
-- Challenge to low temperature growth under the atmospheric pressure --
Toshiyuki Kawaharamura (Kochi Univ. Tech.), Hiroyuki Orita, Takahiro Shirahata (TMEIC), Takuto Igawa, Hiroshi Ito (Kyoto Univ.), Akio Yoshida (TMEIC), Shizuo Fujita (Kyoto Univ.), Takashi Hirao (Kochi Univ. Tech.) |
Magnesium oxide (MgO) thin film is useful as the protective film for plasma display and the antireflective film. Therefo... [more] |
IDY2011-3
pp.45-48 |