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All Technical Committee Conferences (Searched in: Recent 10 Years)
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| Search Results: Conference Papers |
| Conference Papers (Available on Advance Programs) (Sort by: Date Descending) |
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| Committee |
Date Time |
Place |
Paper Title / Authors |
Abstract |
Paper # |
| IDY, SID-JC |
2024-03-08
16:00 |
Online |
online |
[Invited Talk]
Development of Flexible Bezel-less Micro-LED Display Using Through-plastic Vias
Hiroshi Tsuji, Tatsuya Takei, Masashi Miyakawa (NHK), Toshihiro Yamamoto (NHK Foundation), Genichi Motomura, Yoshihide Fujisaki, Mitsuru Nakata (NHK) |
A novel driving technology is developed where data and scanning signals can be input to flexible displays from the backs... [more] |
IDY2024-23
pp.36-39 |
| IDY, IEICE-EID, IEIJ-SSL, SID-JC, IEE-EDD [detail] |
2020-01-24
11:10 |
Tottori |
Tottori Univ |
[Poster Presentation]
Physical properties of anodized aluminum oxide for low temperature processed IGZO thin-film transistors.
Kono Shuya, Mori Marin, Koretomo Daichi, Furuta Mamoru (KUT) |
(To be available after the conference date) [more] |
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| IDY, IEICE-EID, SID-JC [detail] |
2018-07-30
14:15 |
Tokyo |
Kikai-Shinko-Kaikan Bldg. |
[Invited Lecture]
Development of Top-Gate TFTs for Plastic-Film LCDs
Yohei Yamaguchi, Hiroshi Kawanago, Isao Suzumura (JDI) |
A thin-film-transistor (TFT) technology for plastic-film liquid crystal displays (LCDs) was developed herein. Top-gate o... [more] |
IDY2018-36
pp.13-16 |
| IDY |
2018-03-08
15:50 |
Tokyo |
Kikai-Shinko-Kaikan Bldg. |
[Invited Lecture]
Self-Aligned Source/Drain Formation Technology by AlO Sputtering Realizing Highly Reliable Oxide TFT Backplane
Hiroshi Hayashi, Atsuhito Murai, Masanori Miura, Yasuhiro Terai, Yoshihiro Oshima, Tohru Saitoh, Yasunobu Hiromasu, Toshiaki Arai (JOLED) |
We have developed a novel fabrication process of self-aligned top-gate oxide TFT suitable for high resolution and high s... [more] |
IDY2018-21
pp.31-35 |
| IDY |
2018-03-08
16:15 |
Tokyo |
Kikai-Shinko-Kaikan Bldg. |
[Invited Lecture]
Simulation Study of Novel Thin-Film Devices Using Depletion State of Amorphous Oxide Semiconductor
Katsumi Abe, Masato Fujinaga, Takeshi Kuwagaki (Silvaco Japan) |
Novel thin-film devices using amorphous oxide semiconductor (AOS) were studied via device simulation. The simulation of ... [more] |
IDY2018-22
pp.37-41 |
| IDY |
2017-02-24
15:55 |
Tokyo |
Kikai-Shinko-Kaikan Bldg. |
[Invited Talk]
Highly Reliable Oxide TFT with Original Solution-Processed Materials
Yukiko Hirano, Minehide Kusayanagi, Sadanori Arae, Ryoichi Saotome, Yuji Sone, Shinji Matsumoto, Yuki Nakamura, Yuichi Ando, Naoyuki Ueda, Katsuyuki Yamada (Ricoh) |
We have developed original oxide materials and inks to make TFT. The original materials were doped-oxide semiconductor, ... [more] |
IDY2017-23
pp.23-27 |
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